Plasma Etch, Inc. announces a green cleaning breakthrough
Λανσάρισμα προϊόντος ・ 9 Δεκ 2015 ・ Ανάγνωση περισσότερωνPlasma Etch, Inc. announces a green plasma cleaning breakthrough: a commercial grade plasma cleaning system requiring no CF4 gas. Plasma Etch Inc, a leader in plasma innovation, is excited to introduce the first plasma etching systems used in the manufacturing production of PCBs that requires no CF4. The patent pending system only uses 3-phase power and compressed air. The new technology inside the Magna completely eliminates the need for CF4 gas which is presently used by PCB manufacturer’s plasma etching systems for desmear and etch back processing. Magna is the next generation replacement for the company’s time proven MK-II line of systems for desmear and etch back applications. Magna sets new market standards in several key areas. Magna’s revolutionary technology provides faster etch times; lower operating cost, lower power usage, and incredible process uniformity not achievable using existing MK-II type technologies.
